PIC

USER GUIDE

February 1, 2011

Contents

1  Introduction
2  Foundations
 2.1  Resource Management with Sokan
 2.2  Language Development with EMF
3  Developing Composition Systems
 3.1  Using the Composition System Repository
 3.2  Specifying Composition Systems
  3.2.1  Specifying Component Models
  3.2.2  Customising Reuseware’s Composition Language
  3.2.3  Specifying New Composition Languages
 3.3  Deploying Composition Systems
4  Using Composition Systems
 4.1  Using the Fragmnt Repository
 4.2  Developing Fragments with Model Editors
 4.3  Composing Fragments with the Composition Program Editor
 4.4  Composing Fragments with other Composition Languages
5  Scientific Publications

1.  Introduction

2.  Foundations

2.1.  Resource Management with Sokan

Introduce the features available in Eclipse when Sokan is installed.

2.2.  Language Development with EMF

Link to external sources for metamodelling and concrete syntax development

- EMF Book

- GMF Guide

- EUGENIA Homepage

- EMFText Guide

3.  Developing Composition Systems

3.1.  Using the Composition System Repository

3.2.  Specifying Composition Systems

- CSYS

3.2.1.  Specifying Component Models

- REXcm

3.2.2.  Customising Reuseware’s Composition Language

- CPSyntax

3.2.3.  Specifying New Composition Languages

- REXcl

3.3.  Deploying Composition Systems

- Describe how to put a Sokan store into an Eclispe plugin

4.  Using Composition Systems

4.1.  Using the Fragmnt Repository

4.2.  Developing Fragments with Model Editors

4.3.  Composing Fragments with the Composition Program Editor

4.4.  Composing Fragments with other Composition Languages

5.  Scientific Publications

- List of publications about Reuseware (with download link)